ULPMAT

Terbium Iron Alloy

Chemical Name:
Terbium Iron Alloy
Formula:
TbFe
Product No.:
652600
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
652600ST001 TbFe (45/55at%) 99.9% (REO) Ø 50.8 mm x 3.175 mm Inquire
Product ID
652600ST001
Formula
TbFe (45/55at%)
Purity
99.9% (REO)
Dimension
Ø 50.8 mm x 3.175 mm

Terbium Iron Alloy Sputtering Target Overview

Terbium Iron Alloy sputtering target for spintronic devices are high-performance composite targets designed for magneto-optical and spintronic thin film applications. They are widely used in the manufacture of high-end devices such as non-volatile magnetic storage, magneto-optical recording materials, and magnetostrictive elements. The material has a stable composition ratio (45% terbium and 55% iron), combining the high magnetostrictive properties of terbium with the excellent magnetic permeability of iron, giving the film-forming material excellent magnetic property regulation capabilities.

We provide circular, rectangular and annular Terbium Iron Alloy sputtering target for magneto-optical films, supporting customized sizes, connection methods and backplane welding. The products are strictly vacuum melted and uniformly alloyed to ensure that the target microstructure is dense, the chemical composition is uniform, and the magnetic properties are stable. We also provide comprehensive after-sales support. If you have any questions about use, please feel free to contact us regarding our Terbium Iron Alloy sputtering target supplier services.

Product highlights of Terbium Iron Alloy sputtering target

Precise composition ratio: can be fine-tuned according to requirements
Dense structure: 99.9% theoretical density, low porosity, stable sputtering rate
Excellent magnetic properties: high coercivity, adjustable magnetostriction coefficient
Smooth surface treatment, suitable for mainstream PVD system
Applicable processes: DC magnetron sputtering, pulsed laser deposition (PLD), ion beam deposition, etc.
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Applications of Terbium Iron Alloy sputtering target

Magneto-optical recording media: TbFe thin films are widely used in MO disks and magneto-optical sensors due to their magneto-optical Kerr effect
Spintronics devices: can be used to build asymmetric magnetic multilayer structures to increase magnetic storage density
Magnetostrictive sensors/actuators: TbFe alloys have excellent magnetostrictive properties and are suitable for micro-drives or sensor elements
Scientific research and material research: used to study magneto-optical coupling effects, magnetic domain structures and material magnetic transport behaviors

Reports

We provide Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and other relevant reports for each batch of goods. In addition, we also support third-party testing to enhance quality assurance.

Molecular formula: TbFe
Appearance: Silver-gray metal target, surface precision polishing
Morphology: Dense alloy (disc/rectangular, can be bound to backplane)
Purity: 99.9%
Melting point: ~1,450°C (solidus)
Applicable processes: DC magnetron sputtering, RF sputtering
Crystal structure: Cubic system
Stability: Stable in dry air

Inner packaging: vacuum packaging, packaging meets the requirements for dangerous goods packaging
Outer packaging: carton or wooden box, depending on size and weight, meets the requirements for dangerous goods packaging.

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