ULPMAT

Aluminum Oxynitride

Chemical Name:
Aluminum Oxynitride
Formula:
Al23O27N5
Product No.:
13080700
CAS No.:
12633-97-5
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
13080700ST001 Al23O27N5 99.9% Ø 76.2mm x 5mm Inquire
13080700ST002 Al23O27N5 99.95% Ø 76.2mm x 5mm Inquire
Product ID
13080700ST001
Formula
Al23O27N5
Purity
99.9%
Dimension
Ø 76.2mm x 5mm
Product ID
13080700ST002
Formula
Al23O27N5
Purity
99.95%
Dimension
Ø 76.2mm x 5mm

Aluminum Oxynitride Sputtering Target Overview

Aluminum Oxynitride Sputtering Target is a premium-quality ceramic target designed for advanced thin-film deposition applications. Combining excellent optical transparency, high hardness, and chemical stability, AlON targets enable the fabrication of durable, transparent coatings and functional films used in optics, electronics, and protective layers.

Our AlON sputtering targets are manufactured from high-purity raw materials with precise control over composition and microstructure, ensuring consistent sputtering rates, uniform film quality, and superior adhesion. We also offer comprehensive after-sales support—please feel free to contact us if you have any questions.

Product Highlights

High Purity Aluminum Oxynitride: ≥99.9%
High density and uniform microstructure for stable sputtering
Excellent optical transparency and mechanical hardness
Superior chemical and thermal stability
Compatible with RF and DC sputtering systems
Custom sizes and shapes available

Applications of Aluminum Oxynitride Sputtering Targets

Transparent protective and anti-reflective coatings for optics and displays
Hard, wear-resistant coatings for industrial tools and components
Functional thin films in aerospace and defense applications
Electronic devices requiring transparent conductive or insulating layers
Laser optics and sensor technologies

Reports

Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
Density and purity test reports
Optional third-party quality verification

Why Choose Us?

Ultra-high purity raw materials for superior film quality
Precision manufacturing ensures high density and uniformity
Comprehensive technical support for target selection and sputtering process optimization
Global supply chain with reliable logistics and documentation support
Reliable aluminum oxynitride supplier, commitment to innovation and customer satisfaction

Chemical Formula: AlₓOᵧN𝓏
Appearance: Dense, polished ceramic disk or rectangular target
Density: Approximately 3.7–3.9 g/cm³
Melting Point: >2100 °C (decomposes)
Crystal Structure: Cubic spinel-type structure
Thermal Conductivity: Moderate to high, optimized for sputtering performance

Not classified as hazardous

Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.

Outer packaging: Carton or wooden box, depending on size and weight.

Fragile targets: Special protective packaging is used to ensure safe transport.

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