| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 491600ST001 | In2S3 | 99.99% | Ø 76.2 mm x 3.175 mm | Inquire |
| 491600ST002 | In2S3 | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 491600ST003 | In2S3 | 99.999% | Ø 25.4 mm x 6.35 mm | Inquire |
| 491600ST004 | In2S3 | 99.999% | Ø 50.8 mm x 6.35 mm | Inquire |
| 491600ST005 | In2S3 | 99.999% | Ø 76.2 mm x 6.35 mm | Inquire |
| 491600ST006 | In2S3 | 99.999% | Ø 101.6 mm x 3.175 mm | Inquire |
Indium Sulfide (In2S3) sputtering target is a high-purity compound widely used in thin film solar cells, optoelectronics, and semiconductor devices. With excellent optical and electrical properties, In2S3 sputtering targets are ideal for producing uniform and high-performance thin films. Our targets ensure 99.999% purity, high density, and stable sputtering rates for both research and industrial applications.
We provide high-quality Indium Sulfide (In₂S₃) sputtering targets with customizable sizes and bonding options. Contact us for pricing and technical support.
Superior Purity: 99.999% (5N) purity ensures minimal contamination and stable thin film quality.
High Density: Optimized for uniform sputtering and reproducible deposition.
Custom Dimensions: Available in circular, planar, or rectangular shapes, with dimensions tailored to your system.
Backing Plate Options: Optional bonding to improve thermal conductivity and target durability.
Stable Performance: Provides consistent deposition rates, excellent adhesion, and high-quality thin films.
Thin Film Solar Cells: Used as a buffer or absorber layer in CIGS and other thin film solar cells.
Optoelectronic Devices: Suitable for photodetectors, transparent conductive layers, and infrared devices.
Semiconductors: Used for high-performance thin film transistors, sensors, and electronic components.
Research & Development: Supports material science studies and advanced electronics R&D.
Energy Materials: Applied in energy storage and photocatalytic thin film devices.
Industry Expertise: Specialized in advanced sputtering targets for semiconductors, optoelectronics, and thin film applications.
Customized Solutions: Flexible composition, dimensions, and bonding options to meet customer requirements.
Reliable Quality: Strict control of purity, density, and microstructure for reproducible results.
Global Delivery: Fast, secure shipping worldwide with protective packaging.
Technical Support: Professional team provides full documentation and technical consultation.
1. What is an Indium Sulfide Sputtering Target?
An Indium Sulfide Sputtering Target is a ceramic target material made from indium sulfide (In₂S₃) for thin-film deposition using sputtering technology. It is used as a source material to deposit indium sulfide films with controlled composition and semiconductor properties for photovoltaic, optoelectronic, and advanced thin-film research applications.
2. What are Indium Sulfide Sputtering Targets used for?
Indium Sulfide Sputtering Targets are mainly used for depositing In₂S₃ thin films in semiconductor and photovoltaic applications. They are particularly studied as buffer layer materials for thin-film solar cells, including CIGS-based devices, and are also used in optical coatings, compound semiconductor research, and advanced material development.
3. Why is Indium Sulfide used as an alternative to Cadmium Sulfide (CdS)?
Indium Sulfide (In₂S₃) is investigated as an alternative buffer layer material to Cadmium Sulfide (CdS) in thin-film solar cells. It provides suitable semiconductor properties and optical characteristics while avoiding the use of cadmium-containing materials in certain photovoltaic applications.
4. What sputtering methods can be used with Indium Sulfide Targets?
Indium Sulfide Sputtering Targets can be used with sputtering processes such as RF magnetron sputtering and other PVD deposition methods. Process parameters including sputtering power, substrate temperature, working pressure, and sulfur composition control can influence the properties of deposited In₂S₃ films.
5. How do I choose an Indium Sulfide Sputtering Target?
When choosing an Indium Sulfide Sputtering Target, consider purity, target density, target dimensions, thickness, bonding configuration, sputtering equipment compatibility, and required film properties. For compound semiconductor materials, composition stability and target uniformity are important factors affecting deposition consistency.
6. What purity and shapes are available for Indium Sulfide Sputtering Targets?
Indium Sulfide Sputtering Targets are available in different purity grades, commonly including 99.99% ,99.999% and higher grades depending on application requirements. Available configurations may include circular targets, rectangular plates, and customized geometries for different sputtering systems.
7. Can Indium Sulfide Sputtering Targets be customized?
Yes. Indium Sulfide Sputtering Targets can be customized according to purity, dimensions, thickness, target shape, density requirements, bonding method, and sputtering equipment specifications. Customized targets can be supplied for photovoltaic research, semiconductor thin-film deposition, optical coatings, and advanced material applications.
Each batch of In2S3 sputtering targets is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request to meet research and industrial standards.
Chemical Formula: In2S3
Molecular Weight: 325.82 g/mol
Density: 4.85 g/cm³
Melting Point: > 1050°C
Target Purity: 99.99%-99.9995% (customizable)
Appearance: Black or dark gray solid
Shape: Round, rectangular, or custom sizes
Crystal Structure: Cubic
Sputtering Method: DC Magnetron Sputtering (DC)/RF Sputtering (RF)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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