| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 4908300800ST001 | In2O3:ZnO (90/10 wt%) | 99.95% | 299.6 mm x 125 mm x 6mm | Inquire |
| 4908300800ST002 | In2O3:ZnO (60/40 wt%) | 99.95% | 800 mm x 125 mm x 6mm | Inquire |
| 4908300800ST003 | In2O3:ZnO (90/10 wt%) | 99.95% | Ø 25.4 mm x 6.35 mm | Inquire |
| 4908300800ST004 | In2O3:ZnO (60/40 wt%) | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 4908300800ST005 | In2O3:ZnO (95/5 wt%) | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 4908300800ST006 | In2O3:ZnO (90/10 wt%) | 99.95% | Ø 101.6 mm x 3.175 mm | Inquire |
| 4908300800ST007 | In2O3:ZnO (60/40 wt%) | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 4908300800ST008 | In2O3:ZnO (95/5 wt%) | 99.95% | Ø 152.4 mm x 6.35 mm | Inquire |
Indium Zinc Oxide (IZO) sputtering target is a high-purity transparent conductive oxide (TCO) material widely used in thin film electronics, optoelectronic devices, and semiconductor applications. With excellent electrical conductivity, optical transparency, and uniform film formation, IZO sputtering targets are essential for thin film deposition in displays, touch panels, and photovoltaic devices. Our targets ensure 99.95% (3N5) purity, dense structure, and stable performance for industrial and research applications.
We supply high-quality Indium Zinc Oxide sputtering targets for research institutions and manufacturers. Customizable ratio.Contact us for the best price and technical support.
Superior Purity: 99.95% (3N5) purity meets stringent requirements for thin film and TCO applications.
Customizable Composition: In:Zn ratios and target dimensions can be adjusted according to deposition requirements.
High Performance: Excellent electrical conductivity, optical transparency, and stable sputtering characteristics.
Stable Material: Dense structure, uniform composition, and low impurity levels ensure reproducible thin film results.
Thin Film Electronics: Applied in transparent electrodes, thin film transistors (TFTs), and display panels.
Optoelectronic Devices: Used in OLEDs, photodetectors, infrared sensors, and touch panels.
Solar Cells: Suitable for buffer and transparent electrode layers in CIGS and other advanced solar cells.
Research and Development: Widely used in laboratories for material science and device research.
Energy Devices: Applied in transparent conductive films for energy storage and conversion applications.
Industry Expertise: Specialized in supplying high-purity sputtering targets for TCO and thin film technologies.
Customized Solutions: Flexible in target composition, dimensions, and purity specifications.
Reliable Quality: Strict impurity control, dense structure, and uniform composition ensure stable performance.
Global Delivery: Fast, secure shipping worldwide with protective packaging.
Technical Support: Professional team provides full technical documentation and consultation.
F1. What is the purity of your IZO sputtering targets?
A1. Our targets have a standard purity of 99.95% (3N5), ensuring reliable results for advanced thin film and optoelectronic applications.
F2. Can the composition or target size ofIndium Zinc Oxide targets be customized?
A2. Yes, we offer customizable In:Zn ratios and target dimensions according to your deposition system requirements.
F3. How should Indium Zinc Oxide sputtering targets be stored?
A3. Store in a cool, dry environment, away from moisture and contaminants, in protective packaging.
F4. What industries useIndium Zinc Oxide sputtering targets?
A4. Widely used in thin film electronics, optoelectronics, solar cells, semiconductors, and research laboratories.
Each batch of products is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request to meet industrial and research standards.
Chemical Formula: In₂O₃-ZnO
Appearance: Off-white or silver-gray dense target
Melting Point: ~1900°C
Boiling Point: ~2000°C
Crystal Structure: Cubic (In₂O₃ as the primary phase)
Backing Plate Selection: Copper (Cu), Aluminum (Al), or Stainless Steel (SS), selectable based on target size and deposition equipment
Sputtering Method: RF/DC Magnetron Sputtering
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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