| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 4908300800ST001 | In2O3:ZnO (90/10 wt%) | 99.95% | 299.6 mm x 125 mm x 6mm | Inquire |
| 4908300800ST002 | In2O3:ZnO (60/40 wt%) | 99.95% | 800 mm x 125 mm x 6mm | Inquire |
| 4908300800ST003 | In2O3:ZnO (90/10 wt%) | 99.95% | Ø 25.4 mm x 6.35 mm | Inquire |
| 4908300800ST004 | In2O3:ZnO (60/40 wt%) | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 4908300800ST005 | In2O3:ZnO (95/5 wt%) | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 4908300800ST006 | In2O3:ZnO (90/10 wt%) | 99.95% | Ø 101.6 mm x 3.175 mm | Inquire |
| 4908300800ST007 | In2O3:ZnO (60/40 wt%) | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 4908300800ST008 | In2O3:ZnO (95/5 wt%) | 99.95% | Ø 152.4 mm x 6.35 mm | Inquire |
Indium Zinc Oxide (IZO) sputtering target is a high-purity transparent conductive oxide (TCO) material widely used in thin film electronics, optoelectronic devices, and semiconductor applications. With excellent electrical conductivity, optical transparency, and uniform film formation, IZO sputtering targets are essential for thin film deposition in displays, touch panels, and photovoltaic devices. Our targets ensure 99.95% (3N5) purity, dense structure, and stable performance for industrial and research applications.
We supply high-quality Indium Zinc Oxide sputtering targets for research institutions and manufacturers. Customizable ratio.Contact us for the best price and technical support.
Superior Purity: 99.95% (3N5) purity meets stringent requirements for thin film and TCO applications.
Customizable Composition: In:Zn ratios and target dimensions can be adjusted according to deposition requirements.
High Performance: Excellent electrical conductivity, optical transparency, and stable sputtering characteristics.
Stable Material: Dense structure, uniform composition, and low impurity levels ensure reproducible thin film results.
Thin Film Electronics: Applied in transparent electrodes, thin film transistors (TFTs), and display panels.
Optoelectronic Devices: Used in OLEDs, photodetectors, infrared sensors, and touch panels.
Solar Cells: Suitable for buffer and transparent electrode layers in CIGS and other advanced solar cells.
Research and Development: Widely used in laboratories for material science and device research.
Energy Devices: Applied in transparent conductive films for energy storage and conversion applications.
Industry Expertise: Specialized in supplying high-purity sputtering targets for TCO and thin film technologies.
Customized Solutions: Flexible in target composition, dimensions, and purity specifications.
Reliable Quality: Strict impurity control, dense structure, and uniform composition ensure stable performance.
Global Delivery: Fast, secure shipping worldwide with protective packaging.
Technical Support: Professional team provides full technical documentation and consultation.
1. What is an Indium Zinc Oxide (IZO) Sputtering Target?
An Indium Zinc Oxide (IZO) Sputtering Target is a ceramic oxide target composed of indium oxide (In₂O₃) and zinc oxide (ZnO) used for sputtering deposition of transparent conductive oxide (TCO) thin films. IZO targets are designed to produce conductive and transparent oxide layers for advanced electronic and optoelectronic applications.
2. What is the composition of an IZO Sputtering Target?
IZO Sputtering Targets are composed of indium oxide (In₂O₃) and zinc oxide (ZnO). The In₂O₃/ZnO ratio can be adjusted according to the required electrical conductivity, optical transparency, and thin-film characteristics. Different compositions are selected depending on the deposition process and final device requirements.
3. What are IZO Sputtering Targets used for?
IZO Sputtering Targets are used to produce transparent conductive oxide films for applications including displays, touch panels, photovoltaic devices, sensors, optical coatings, and flexible electronic devices. IZO films are valued for their transparency, electrical conductivity, and compatibility with different substrate conditions.
4. What is the difference between IZO and ITO Sputtering Targets?
The main difference between IZO and ITO Sputtering Targets is the dopant oxide system. ITO consists mainly of indium oxide (In₂O₃) and tin oxide (SnO₂), while IZO consists of indium oxide (In₂O₃) and zinc oxide (ZnO). IZO can provide different electrical, optical, and processing characteristics compared with ITO, making it suitable for applications where alternative transparent conductive properties are required.
5. Why choose an IZO Sputtering Target instead of an ITO Target?
IZO Sputtering Targets may be selected when specific thin-film properties, substrate compatibility, or processing conditions are required. Compared with conventional ITO, IZO is studied for applications such as flexible electronics and low-temperature deposition processes because its film properties can be adjusted through composition and sputtering conditions.
6. How do I choose an IZO Sputtering Target?
When choosing an IZO Sputtering Target, consider the In₂O₃/ZnO composition ratio, purity, target density, dimensions, thickness, bonding configuration, sputtering equipment, and required film properties. Target uniformity, density, and composition consistency can influence sputtering stability and deposited film quality.
7. Can Indium Zinc Oxide (IZO) Sputtering Targets be customized?
Yes. IZO Sputtering Targets can be customized according to composition ratio, purity, target dimensions, thickness, density, geometry, bonding method, and sputtering system requirements. Customized IZO targets can be supplied for research, display, photovoltaic, optical coating, and advanced electronic applications.
Each batch of products is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request to meet industrial and research standards.
Chemical Formula: In₂O₃-ZnO
Appearance: Off-white or silver-gray dense target
Melting Point: ~1900°C
Boiling Point: ~2000°C
Crystal Structure: Cubic (In₂O₃ as the primary phase)
Backing Plate Selection: Copper (Cu), Aluminum (Al), or Stainless Steel (SS), selectable based on target size and deposition equipment
Sputtering Method: RF/DC Magnetron Sputtering
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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