Indium Oxide-Gallium Oxide (In2O3-Ga2O3) sputtering target is a high-purity ceramic material widely applied in transparent electronics, optoelectronic devices, and advanced semiconductor research. With excellent optical transparency, stable electrical conductivity, and superior thermal properties, In2O3-Ga2O3 target is ideal for thin film deposition in display technologies, power electronics, and next-generation optoelectronic components.
Our In2O3-Ga2O3 sputtering targets are manufactured with 99.99% (4N) purity, high density, and uniform microstructure, ensuring consistent thin film performance and reproducibility for both industrial and academic applications.
High Purity: 99.99% (4N) ensures reliable optical and electronic performance.
Stable Microstructure: Dense and uniform for improved sputtering efficiency.
Excellent Transparency: Suitable for transparent conductive and functional thin films.
Thermal Stability: Withstands high-temperature thin film deposition processes.
Flexible Specifications: Round, rectangular, or custom shapes available.
Transparent Electronics: Used in transparent conductive layers and thin film devices.
Optoelectronic Devices: Applied in sensors, detectors, and advanced optical coatings.
Thin Film Transistors (TFTs): Functional layers for display backplanes.
Power Electronics: Ga₂O₃ enhances high-voltage and high-frequency performance.
R&D Materials: Widely used in laboratories for semiconductor and material science research.
Professional Manufacturing: Focusing on the supply of high-purity oxide and semiconductor sputtering targets.
Customized Specifications: Supporting customization of target size, purity, and composition ratios.
Strict Quality Control: Utilizing ICP-MS impurity analysis to ensure low impurity levels.
Global Delivery: Providing secure packaging and fast logistics services.
Technical Support: Each batch of products comes with a complete COA, TDS, MSDS, and impurity analysis report.
F1. What purity level do you provide for Indium Oxide-Gallium Oxide sputtering targets?
A1. Standard purity is 99.99% (4N). Higher purities are available upon request.
F2. Can you supply different shapes and dimensions?
A2. Yes, we provide circular, rectangular, and custom-shaped targets according to customer needs.
F3. What backing plate options are available?
A3. We offer Cu, Mo, and Al backing plates depending on deposition requirements.
F4. How are the targets packaged?
A4. Vacuum-sealed and protected with anti-shock packaging to ensure safe delivery.
F5. What industries mainly use In2O3-Ga2O3 targets?
A5. They are used in transparent conductive films, optoelectronics, TFT displays, and power electronics research.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Molecular Formula: In₂O₃-Ga₂O₃
Appearance: Off-white or light gray dense ceramic target
Crystal Structure: Cubic (In₂O₃ primary phase), Monoclinic/Orthorhombic (Ga₂O₃ phase)
Bonding Method: Available in unbonded, In₂O₃ bonding, or mechanically fixed
Backing Plate Options: Copper (Cu), molybdenum (Mo), aluminum (Al), customizable upon request
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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