Indium Oxide

Indium Oxide Sputtering Target Overview

Indium Oxide (In2O3) sputtering target is a high-purity ceramic material widely used in transparent conductive films, optoelectronic devices, and advanced semiconductor research. With excellent optical transparency, controllable conductivity, and stable chemical properties, In₂O₃ sputtering target is ideal for thin film deposition in displays, solar cells, and functional coatings.

Our In2O3 sputtering targets are manufactured with 99.995% (4N5) purity or higher, featuring high density, uniform microstructure, and stable performance to ensure reproducible thin film quality for both industrial production and academic research.

Product Highlights of Indium Oxide Sputtering Target

High Purity: 99.995% (4N5) or higher ensures reliable thin film performance.
Excellent Transparency: High optical transmission in the visible range.
Stable Electrical Properties: Adjustable resistivity suitable for optoelectronic applications.
Dense Microstructure: High sintering density improves sputtering efficiency.
Flexible Options: Custom shapes, bonding, and backing plates available.

Applications of Indium Oxide Sputtering Target

Transparent Conductive Films: Used in displays, OLEDs, and touch panels.
Optoelectronic Devices: Applied in photodetectors, sensors, and functional thin films.
Thin Film Solar Cells: Suitable for electrode and buffer layers.
Semiconductors: For thin film transistors and integrated devices.
Research & Development: Widely used in laboratories for oxide electronics.

Why Choose us?

Professional Supplier: Specializing in transparent conductive and semiconductor sputtering targets.
Customization Support: Flexible customization of size, purity, and composition.
Strict Quality Control: ICP-MS impurity analysis ensures ultra-low impurity levels.
Global Delivery: Secure packaging, fast shipping, supporting international customers.
Complete Documentation: Providing COA, TDS, MSDS, and impurity reports.。

FAQs

1. What is an Indium Oxide Sputtering Target?

An Indium Oxide Sputtering Target is a high-purity ceramic target made from indium(III) oxide (In₂O₃) for physical vapor deposition (PVD) and sputtering processes. It is used to deposit indium oxide thin films with controlled electrical, optical, and semiconductor properties for applications in electronics, optoelectronics, displays, and advanced thin-film research.

2. What are Indium Oxide Sputtering Targets used for?

Indium Oxide Sputtering Targets are used to deposit transparent conductive and semiconductor thin films for displays, optoelectronic devices, photovoltaic technologies, sensors, and other advanced electronic applications. In₂O₃ is also used as a material platform for developing indium-based oxide films and transparent conductive oxide (TCO) materials.

3. What is the difference between an Indium Oxide Target and an ITO Target?

An Indium Oxide Target consists primarily of In₂O₃, while an ITO Target is a tin-doped indium oxide material consisting mainly of In₂O₃ with SnO₂ added to modify its electrical and optical properties. ITO is widely used to produce transparent conductive films, whereas a pure In₂O₃ Target is selected when an indium oxide composition is specifically required.

4. What purity is available for Indium Oxide Sputtering Targets?

Indium Oxide Sputtering Targets are available in different purity grades according to the required film quality and impurity-control requirements. High-purity grades such as 99.99% and higher can be used for demanding thin-film, semiconductor, optoelectronic, and research applications. The appropriate purity should be selected based on the required impurity limits and deposition process.

5. How do I choose an Indium Oxide Sputtering Target?

When choosing an Indium Oxide Sputtering Target, consider the required purity, target density, dimensions, thickness, target geometry, bonding configuration, sputtering system, and intended film application. For high-quality thin-film deposition, target density, uniformity, composition, and microstructure can affect sputtering stability and film performance.

6. What shapes and sizes are available for Indium Oxide Sputtering Targets?

Indium Oxide Sputtering Targets can be supplied in planar and other target configurations, with dimensions and thicknesses selected according to the sputtering equipment. Standard and custom sizes can be produced, including customized target dimensions, mounting configurations, and backing-plate requirements. The appropriate geometry should be confirmed according to the cathode and deposition system.

7. Can Indium Oxide Sputtering Targets be customized?

Yes. Indium Oxide Sputtering Targets can be customized according to purity, dimensions, thickness, density, target geometry, bonding method, and backing-plate requirements. Custom specifications can be provided for research systems, laboratory sputtering equipment, and large-area thin-film deposition systems.

Reports

Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.