Tin metal

Tin Metal Sputtering Target Overview

Tin Metal Sputtering Target is a high-purity metal target used in sputtering deposition processes for electronic, semiconductor, and thin-film applications. Tin is widely valued for its excellent conductivity, corrosion resistance, and stability, making it an ideal material for applications in electronics, energy storage, and optical coatings.

We offer Tin metal sputtering targets in various purity grades and sizes, tailored to meet specific requirements for different sputtering systems and applications. Our technical team is available to assist with material selection, performance evaluation, and application development. For any inquiries or technical support, please feel free to contact us.

Product Highlights

Purity: 99.99%
Excellent electrical conductivity: Ideal for thin-film deposition in semiconductor and electronic devices
Corrosion resistance: Provides reliable performance in various environmental conditions
Thermal stability: Suitable for high-temperature sputtering processes
Customizable sizes and shapes: Target sizes and shapes can be customized to meet specific sputtering system needs

Applications of Tin Metal Sputtering Target 

Semiconductor fabrication: Used for the deposition of tin thin films in semiconductor manufacturing, such as for interconnects, capacitors, and memory devices
Solar cells: Ideal for deposition of back contact layers and conductive coatings in photovoltaic devices
Optical coatings: Applied in the deposition of tin films for optical coatings, including mirrors and filters
Electronic components: Used in the production of thin films for components like resistors, capacitors, and sensors
Catalysis: Employed in catalyst coatings for various chemical processes

Reports

Each shipment of Tin metal sputtering target is accompanied by:
Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
Optional third-party testing reports for enhanced quality assurance

FAQ

Q1: What purity grades are available for Tin metal sputtering targets?
A1: We provide 99.9% and higher purity targets, ensuring high-quality thin films with excellent conductivity and stability.

Q2: Can Tin metal sputtering targets be used in high-temperature sputtering processes?
A2: Yes, Tin sputtering targets exhibit excellent thermal stability, making them suitable for high-temperature sputtering applications.

Q3: How is Tin used in semiconductor manufacturing?
A3: Tin is used for the deposition of conductive thin films in semiconductor devices, including for interconnects and capacitors, providing reliable electrical performance.

Q4: Can you customize the size and shape of Tin metal sputtering targets?
A4: Yes, we offer custom sizes and shapes for Tin sputtering targets to fit your specific sputtering system and application requirements.