Tellurium metal

Tellurium metal sputtering targets Overview

Tellurium metal sputtering targets are high-performance metal materials designed specifically for thin film deposition processes. With a purity of up to 99.999%, they offer excellent density and good conductivity, ensuring uniform thin film deposition, strong adhesion, and extremely low impurity levels. They are widely used in optoelectronic devices, semiconductors, and functional thin films.

We offer Tellurium metal sputtering targets in a variety of sizes, including round and rectangular shapes, which can be customized to meet specific customer needs. Furthermore, we provide a dedicated after-sales technical support team to ensure your production applications are always up to date.

Product Highlights

Purity: 99.999%
High density ensures uniform thin film deposition
Excellent conductivity and process compatibility
Customizable sizes and shapes
Suitable for optoelectronic device and semiconductor manufacturing, as well as the preparation of specialized functional thin films.

Applications of Tellurium metal sputtering target

Semiconductors: Used for the fabrication of active layers and functional thin films for high-performance semiconductor devices.
Optoelectronics: Deposition of functional thin films in optical sensors, infrared detectors, and optical waveguides.
Photovoltaics: Used as the active layer material in specialty solar cells to improve photoelectric conversion efficiency. Functional Films: Suitable for the fabrication of infrared reflective, nonlinear optical, and acousto-optic modulation films.

Reports

We provide a detailed Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and relevant compliance reports for each batch of Te sputtering targets. We also support third-party testing services to ensure consistent and reliable product quality.