Aluminum Zinc Alloy Sputtering Target is a high-purity alloy target designed for thin-film deposition applications requiring the lightweight, excellent conductivity of aluminum combined with the enhanced strength and corrosion resistance of zinc.
Manufactured using ultra-high-purity raw materials and advanced alloying processes, our Al-Zn sputtering targets offer uniform composition, high density, and low impurities, ensuring stable sputtering performance and excellent film uniformity. We also offer comprehensive after-sales support—please feel free to contact us if you have any questions.
Purity: ≥99.9%
Customizable Al-Zn alloy compositions
High density and purity for consistent sputtering
Excellent corrosion resistance and mechanical strength
Superior thermal stability
Uniform microstructure for high-quality film deposition
Available in circular, rectangular, and custom shapes and sizes
Thin films for electronic and semiconductor devices
Protective coatings in automotive and aerospace industries
Corrosion-resistant coatings for various industrial applications
Optical and sensor device coatings
Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
Third-party testing available upon request
Chemical Formula: AlZn
Appearance: Silver gray
Density: Approx. 2.7–7.1 g/cm³ (composition dependent)
Melting Point: Approx. 660–419.5 °C (depending on alloy ratios)
Crystal Structure: Face-Centered Cubic (FCC) aluminum with zinc phases
Magnetic Properties: Generally non-magnetic
Corrosion Resistance: Excellent, improved by zinc content
Chemical Reactivity: Stable under sputtering and ambient conditions
Not classified as hazardous
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
