Aluminum Tantalum Zirconium Alloy Sputtering Target is a high-performance composite target engineered for advanced thin-film deposition applications requiring a combination of lightweight aluminum with the exceptional strength, corrosion resistance, and thermal stability of tantalum and zirconium.
Manufactured from ultra-high-purity raw materials through precise alloying and densification processes, our Aluminum Tantalum Zirconium Alloy sputtering targets offer uniform composition, high density, and low impurities, ensuring stable sputtering performance and superior film quality. We also offer comprehensive after-sales support—please feel free to contact us if you have any questions.
Purity: ≥99.9%
Customizable Al-Ta-Zr compositions to meet specific application needs
High density and purity for consistent sputtering
Excellent corrosion resistance and thermal stability
Enhanced mechanical strength and oxidation resistance
Uniform microstructure for superior film adhesion and uniformity
Available in various shapes and sizes (circular, rectangular, custom)
Semiconductor device fabrication
Protective and wear-resistant coatings
Aerospace and high-temperature applications
Corrosion-resistant films
Advanced electronic and optical coatings
Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
Third-party testing upon request
Chemical Formula: AlTaZr
Appearance: Gray
Density: Approx. 4.5–6.5 g/cm³
Melting Point: Approx. 1200–1800 °C
Magnetic Properties: Typically non-magnetic
Corrosion Resistance: Excellent, due to Ta and Zr content
Chemical Reactivity: Stable under sputtering conditions
Not classified as hazardous
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
