| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 1300ST001 | Al | 99.99% | Ø 25.4 mm x 3.175 mm | Inquire |
| 1300ST002 | Al | 99.995% | Ø 25.4 mm x 3.175 mm | Inquire |
| 1300ST003 | Al | 99.9999% | Ø 25.4 mm x 3.175 mm | Inquire |
| 1300ST004 | Al | 99.99% | Ø 25.4 mm x 6.35 mm | Inquire |
| 1300ST005 | Al | 99.995% | Ø 25.4 mm x 6.35 mm | Inquire |
| 1300ST006 | Al | 99.9999% | Ø 25.4 mm x 6.35 mm | Inquire |
| 1300ST007 | Al | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 1300ST008 | Al | 99.999% | Ø 50.8 mm x 3.175 mm | Inquire |
| 1300ST009 | Al | 99.9995% | Ø 50.8 mm x 3.175 mm | Inquire |
| 1300ST010 | Al | 99.99% | Ø 50.8 mm x 6.35 mm | Inquire |
| 1300ST011 | Al | 99.995% | Ø 50.8 mm x 6.35 mm | Inquire |
| 1300ST012 | Al | 99.9999% | Ø 50.8 mm x 6.35 mm | Inquire |
| 1300ST013 | Al | 99.999% | Ø 76.2 mm x 2 mm | Inquire |
| 1300ST014 | Al | 99.99% | Ø 76.2 mm x 3.175 mm | Inquire |
| 1300ST015 | Al | 99.999% | Ø 76.2 mm x 3.175 mm | Inquire |
| 1300ST016 | Al | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 1300ST017 | Al | 99.999% | Ø 76.2 mm x 6.35 mm | Inquire |
| 1300ST018 | Al | 99.9999% | Ø 76.2 mm x 6.35 mm | Inquire |
| 1300ST019 | Al | 99.99% | Ø 101.6 mm x 3.175 mm | Inquire |
| 1300ST020 | Al | 99.995% | Ø 101.6 mm x 3.175 mm | Inquire |
| 1300ST021 | Al | 99.9995% | Ø 101.6 mm x 3.175 mm | Inquire |
| 1300ST022 | Al | 99.99% | Ø 101.6 mm x 6.35 mm | Inquire |
| 1300ST023 | Al | 99.999% | Ø 101.6 mm x 6.35 mm | Inquire |
| 1300ST024 | Al | 99.9995% | Ø 101.6 mm x 6.35 mm | Inquire |
| 1300ST025 | Al | 99.99% | Ø 152.4 mm x 3.175 mm | Inquire |
| 1300ST026 | Al | 99.999% | Ø 152.4 mm x 3.175 mm | Inquire |
| 1300ST027 | Al | 99.99% | Ø 152.4 mm x 6.35 mm | Inquire |
| 1300ST028 | Al | 99.9999% | Ø 152.4 mm x 6.35 mm | Inquire |
Aluminum sputtering targets are high-performance materials designed for use in thin-film deposition processes. With purities up to 99.99995% and excellent density, they ensure uniform film formation, strong adhesion, and minimal impurities.
We offer aluminum sputtering targets in a variety of shapes and sizes, including round and rectangular forms, and can customize them according to your specific requirements. We also provide comprehensive after-sales support—please feel free to contact us if you have any questions regarding their use.
Product Highlights:
Purity: ≥99.99% to 99.99995%
High density for uniform film deposition
Customizable sizes and shapes
Ideal for semiconductors, displays, solar cells, and optical coatings
Applications of Aluminum Sputtering Targets
Semiconductors: Used for interconnects and contact layers due to excellent conductivity and process compatibility.
Flat Panel Displays: Applied as reflective or electrode layers in LCD and OLED displays.
Photovoltaics: Serves as a back electrode in thin-film solar cells, offering high reflectivity and stability.
Optical Coatings: Forms high-reflectivity or functional coatings on lenses, mirrors, and optical components.
Reports
We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant reports with each shipment. Additionally, we support third-party testing for added quality assurance.
Development
Our company is committed to continuous research and development, driving innovation in advanced materials and thin-film technologies. With a dedicated R&D team and state-of-the-art facilities, we focus on optimizing material performance, developing customized solutions, and staying at the forefront of industry trends. This commitment enables us to meet evolving customer needs and support cutting-edge applications across electronics, energy, and optical fields.
Why Choose Us?
High Purity Materials: We provide ultra-high purity targets and powders (up to 99.99995%) to ensure superior performance in critical applications.
Customization Capability: Tailored solutions in size, shape, and composition to meet specific customer requirements.
Advanced Manufacturing: State-of-the-art equipment and strict quality control deliver consistent, high-density, and defect-free products.
Technical Expertise: A professional R&D team with deep industry knowledge to support material selection and process optimization.
Reliable Service: Fast response, global support, and a commitment to long-term partnerships.
FAQ
Q1: What is the typical purity of your aluminum sputtering targets?
A1: Our aluminum targets are available with purities ranging from 99.99% (4N) to 99.999% (5N).
Q2: Can you provide custom sizes and shapes?
A2: Yes, we offer full customization according to your specifications, including diameter, thickness, and mounting styles.
Q3: What industries are your sputtering targets used in?
A3: Our targets are widely used in semiconductors, displays, solar cells, optical coatings, and data storage.
Q4: What is the minimum order quantity (MOQ)?
A4: The MOQ depends on the product type. Please contact us for specific details.
Q5: Do you offer technical support?
A5: Yes, our technical team can assist with material selection, process optimization, and application advice.
Chemical Formula: Al
Appearance: Silvery-white metallic, smooth surface
Density: 2.70 g/cm³
Melting Point: 660.3 °C
Boiling Point: 2,470 °C
Thermal Conductivity: 235 W/m·K (excellent thermal performance)
Electrical Conductivity: 3.77 × 10⁷ S/m (high conductivity)
Specific Heat Capacity: 0.897 J/g·K
Thermal Expansion Coefficient: 23.1 × 10⁻⁶ /K
Crystal Structure: Face-Centered Cubic (FCC)
Magnetic Properties: Non-magnetic
Corrosion Resistance: Good; forms a protective oxide layer
Chemical Reactivity: Reactive with acids; stable in air due to oxide film
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
