ULPMAT

Hafnium metal

Chemical Name:
Hafnium metal
Formula:
Hf
Product No.:
7200
CAS No.:
7440-58-6
EINECS No.:
231-166-4
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
7200ST001 Hf 99.9% (Zr< 2%) Ø 25.4 mm x 3.175 mm Inquire
7200ST002 Hf 99.9% (Zr< 2%) Ø 50.8 mm x 3.175 mm Inquire
7200ST003 Hf 99.9% (Zr< 2%) Ø 76.2 mm x 3.175 mm Inquire
7200ST004 Hf 99.9% (Zr< 2%) Ø 25.4 mm x 6.35 mm Inquire
7200ST005 Hf 99.9% (Zr< 2%) Ø 50.8 mm x 6.35 mm Inquire
7200ST006 Hf 99.9% (Zr< 2%) Ø 76.2 mm x 6.35 mm Inquire
7200ST007 Hf 99.9% (Zr< 2%) Ø 101.6 mm x 6.35 mm Inquire
Product ID
7200ST001
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 25.4 mm x 3.175 mm
Product ID
7200ST002
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
7200ST003
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
7200ST004
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 25.4 mm x 6.35 mm
Product ID
7200ST005
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
7200ST006
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
7200ST007
Formula
Hf
Purity
99.9% (Zr< 2%)
Dimension
Ø 101.6 mm x 6.35 mm

Hafnium metal sputtering targets Overview

Hafnium metal sputtering targets are high-performance materials designed specifically for thin film deposition processes. With a purity of 99.9%, they offer excellent thermal stability, density, and strength, ensuring uniform thin film deposition, strong adhesion, and extremely low impurity levels.

We offer Hafnium metal sputtering targets in a variety of shapes and sizes, including round, rectangular, and custom sizes, to meet the specific needs of our customers. We also provide comprehensive after-sales support; please feel free to contact us if you have any questions.

Product Highlights

Purity: 99.9%

High density ensures uniform thin film deposition

High strength and thermal stability for high-power sputtering applications

Customizable sizes and shapes

Target bonding services available

Suitable for applications in semiconductors, optical coatings, aerospace, and other fields

Applications of Hafnium metal sputtering target

Semiconductors: Used for high-temperature, high-power thin film deposition, such as electrode and contact layers.

Optical Coatings: Used to form highly reflective, high-hardness thin films for applications such as optical components and mirrors. Aerospace: Hf sputtering targets offer excellent corrosion resistance and high-temperature performance in high-temperature, high-pressure environments, making them widely used in aerospace coatings.
Electrical and Energy: They offer exceptional stability and reliability in applications such as solar films and functional films.

Reports

We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant reports with each shipment. We also support third-party testing to enhance product quality assurance.

Molecular Formula: Hf
Molecular Weight: 178.49 g/mol
Appearance: Silvery-white metal with a smooth surface
Density: Approximately 13.31 g/cm³ (close to theoretical density)
Melting Point: Approximately 2,233 °C
Crystal Structure: Hexagonal Close-Packed (hcp)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 7200ST Category Brand:

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