ULPMAT

Tantalum Nitride

Chemical Name:
Tantalum Nitride
Formula:
TaN
Product No.:
730700
CAS No.:
12033-62-4
EINECS No.:
234-788-4
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
730700ST001 TaN 99.5% Ø 25.4 mm x 6.35 mm Inquire
730700ST002 TaN 99.5% Ø 50.8 mm x 3.175 mm Inquire
730700ST003 TaN 99.5% Ø 76.2 mm x 3.175 mm Inquire
730700ST004 TaN 99.5% Ø 101.6 mm x 6.35 mm Inquire
730700ST005 TaN 99.5% Ø 203.2 mm x 6.35 mm Inquire
730700ST006 TaN 99.9% Ø 76.2 mm x 6.35 mm Inquire
730700ST007 TaN 99.9% Ø 101.6 mm x 6.35 mm Inquire
Product ID
730700ST001
Formula
TaN
Purity
99.5%
Dimension
Ø 25.4 mm x 6.35 mm
Product ID
730700ST002
Formula
TaN
Purity
99.5%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
730700ST003
Formula
TaN
Purity
99.5%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
730700ST004
Formula
TaN
Purity
99.5%
Dimension
Ø 101.6 mm x 6.35 mm
Product ID
730700ST005
Formula
TaN
Purity
99.5%
Dimension
Ø 203.2 mm x 6.35 mm
Product ID
730700ST006
Formula
TaN
Purity
99.9%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
730700ST007
Formula
TaN
Purity
99.9%
Dimension
Ø 101.6 mm x 6.35 mm

Tantalum Nitride sputtering targets Overview

Tantalum Nitride sputtering targets are high-performance ceramic materials designed for advanced thin film deposition processes. They are high in purity, dense in structure, and have excellent hardness and thermal stability, ensuring uniform film formation and long-term stable process performance.

We offer a variety of Tantalum Nitride sputtering targets in various specifications and sizes, which can be customized according to the special needs of customers. We also provide a full range of after-sales technical support. If you have any questions, please feel free to contact us.

Product highlights

Purity: 99.5% to 99.9%
High density to ensure uniform film deposition
Customizable size and shape to meet the needs of different equipment
Suitable for semiconductor devices, hard coatings and wear-resistant protective films

Applications of Tantalum Nitride sputtering target

Semiconductors: used as diffusion barriers and conductive layers with good thermal stability and corrosion resistance.
Hard coatings: widely used to enhance the hardness and wear resistance of the surface of cutting tools, molds and mechanical parts.
Wear-resistant protective films: used to improve the wear resistance of equipment and extend service life.
Microelectronic devices: as low-resistance contact layers and protective layers to improve device performance stability.

Report

We provide detailed Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and related quality inspection reports for each batch of TaN sputtering targets to ensure stable and reliable product quality. At the same time, we support third-party testing services to provide customers with higher quality assurance.

Molecular formula: TaN
Molecular weight: 183.84 g/mol
Appearance: Dark gray dense ceramic target with smooth and uniform surface
Density: about 14.5 g/cm³ (close to theoretical density)
Melting point: about 3,700 °C
Crystal structure: face-centered cubic (fcc)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 730700ST Category Brand:

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded