ULPMAT

Tungsten metal

Chemical Name:
Tungsten metal
Formula:
W
Product No.:
7400
CAS No.:
7440-33-7
EINECS No.:
231-143-9
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
7400ST001 W 99.95% Ø 25.4 mm x 3.175 mm Inquire
7400ST002 W 99.95% Ø 25.4 mm x 6.35 mm Inquire
7400ST003 W 99.95% Ø 50.8 mm x 3.175 mm Inquire
7400ST004 W 99.95% Ø 50.8 mm x 6.35 mm Inquire
7400ST005 W 99.95% Ø 76.2 mm x 3.175 mm Inquire
7400ST006 W 99.95% Ø 76.2 mm x 6.35 mm Inquire
7400ST007 W 99.95% Ø 101.6 mm x 3.175 mm Inquire
7400ST008 W 99.95% Ø 101.6 mm x 6.35 mm Inquire
7400ST009 W 99.95% 214 mm x 56 mm x 12mm Inquire
7400ST010 W 99.95% 764 mm x 131 mm x 14 mm Inquire
Product ID
7400ST001
Formula
W
Purity
99.95%
Dimension
Ø 25.4 mm x 3.175 mm
Product ID
7400ST002
Formula
W
Purity
99.95%
Dimension
Ø 25.4 mm x 6.35 mm
Product ID
7400ST003
Formula
W
Purity
99.95%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
7400ST004
Formula
W
Purity
99.95%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
7400ST005
Formula
W
Purity
99.95%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
7400ST006
Formula
W
Purity
99.95%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
7400ST007
Formula
W
Purity
99.95%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
7400ST008
Formula
W
Purity
99.95%
Dimension
Ø 101.6 mm x 6.35 mm
Product ID
7400ST009
Formula
W
Purity
99.95%
Dimension
214 mm x 56 mm x 12mm
Product ID
7400ST010
Formula
W
Purity
99.95%
Dimension
764 mm x 131 mm x 14 mm

Tungsten metal sputtering targets Overview

Tungsten metal sputtering targets are high-performance materials developed for thin film deposition processes in harsh environments. They have extremely high melting points, excellent thermal stability and excellent mechanical strength. With a high purity of up to 99.95%, they perform well in semiconductor, optoelectronic and functional thin film applications.

We offer tungsten metal targets in a variety of shapes and sizes, including round, rectangular and ring shapes, and can be customized according to customer needs. We are also equipped with a complete after-sales service support system to help you advance your project efficiently.

Product highlights

Purity: 99.95%
High melting point (about 3,420°C), suitable for high-temperature deposition environments
High hardness and high density (about 19.3 g/cm³)
Excellent corrosion resistance
Customizable size, shape and installation method

Applications of Tungsten metal sputtering target

Semiconductor devices: used for gates, electrodes and barrier layers, especially for advanced processes such as CMOS and DRAM.
Memory and packaging: suitable for metal gates, via filling, buffer layers, etc.
Flat panel displays: used as gate materials in TFT-LCD and AMOLED manufacturing.
Photovoltaic modules: used in CIGS and perovskite cell back electrodes, etc.
High temperature resistant optical coating: provides high reflectivity and stability, used in infrared windows or reflectors, etc.

Report

We provide a full set of Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and Dimensional Tolerance Report with the goods. If customers need third-party testing services, we can also help arrange them to ensure the traceability and compliance of product quality.

Molecular formula: W
Molecular weight: 183.84 g/mol
Appearance: Silver-grey metal target with smooth surface
Density: about 19.3 g/cm³ (close to theoretical density)
Melting point: about 3,422 °C (one of the highest among all metals)
Crystal structure: body-centered cubic (BCC)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 7400ST Category Brand:

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